Argonne National Laboratory
Dr. Ashwin Jayaraman is a Postdoctoral Appointee in Argonne National Laboratory’s Applied Materials Division working in Jeff Elam’s Functional Coatings group. He has research and development experience in the field of semiconductor thin film atomic layer deposition for transistor and chalcogenide solar cell applications. Ashwin graduated with a Masters in Materials Engineering from Indian Institute of Science, Bengaluru, India and received his doctoral degree from Harvard University, USA in Professor Roy Gordon’s research group. His thesis work was on synthesizing conduction band aligned electron transport layer alternatives to cadmium sulfide for copper zinc tin sulfide solar absorbers. He is currently working on developing novel resistive and secondary electron emissive coatings for microchannel plate applications in Argonne. Besides this Ashwin is interested in atomic layer deposition of 2d transition metal dichalcogenide materials for sensor applications.
Dr. Anil Mane is Principal Material Science Engineer at applied materials division (AMD), Argonne National Laboratory (ANL). He has 15+ years’ R&D experience in thin film nanostructure materials growth especially via ALD/CVD, nanomaterial characterization & materials integration into nano-devices. He worked in semiconductor industries and has hand-on expertise with commercial high-volume production of CVD & ALD multi-station wafer processing tools and processes. 75+ peer-reviewed publications, 25+ patents, 4 R&D100 awards (known as the “Oscars of Innovation”). Completed the DOE Energy I-Corps Cohort 9 program. His current research interests:
- Research and development of next-generation technologically feasible nanostructure materials design, creation and engineering, especially by ALD/CVD techniques.
- In-situ materials growth study, focus on surface/interface engineering, thorough materials and test devices characterizations and search for near-term emerging applications and technology commercialization.
- Photodetectors, creation of electron amplifying devices, Li-ion batteries, 2D Materials, nanocomposites functional coatings, etc,
Dr. Jeff Elam is a Senior Chemist and Group Leader at Argonne National Laboratory where he directs a program in atomic layer deposition (ALD) technology with the goal of developing new applications for ALD in fields such as solar power, energy storage, water remediation, and large-area detectors. Jeff earned his B.A. in Chemistry from Cornell University and his Ph.D. in Physical Chemistry from the University of Chicago. As a Postdoctoral Researcher at the University of Colorado, Jeff developed ALD thin film growth methods. Dr. Elam has authored over 250 papers and is an inventor on over 100 patents and inventions related to ALD. Jeff won the ALD Innovation Award in 2017, and has received five R&D100 Awards including the Editor’s Choice Award for “Oleo Sponge”, the top invention in 2017. Dr. Elam is an AVS Fellow and is involved in chairing and organizing sessions at AVS and ECS.